Source: https://tendernation.io/opportunities/01a13bf0-0f2f-71fa-8f36-ed3bc634acac/ebl-electron-beam-lithography-equipment-2-lots closed GB open procedure # EBL\_Electron Beam Lithography Equipment\_2 LOTS [The University of Nottingham](https://tendernation.io/buyers/the-university-of-nottingham) Estimated value Not stated Published 7 Jan 2016 Deadline Closed 21 Jan 2016 ## Who can bid - Open procedure Anyone can submit a full tender; there is no shortlisting stage. ## About this tender EBL Instrument (Lot1) and Lithography Data Prep System (Lot2) - Lot 1 The electron beam lithography (EBL) instrument requires both high performance and high reliability. Examples of key research goals include: - Patterning novel resists including self-assembled monolayers (SAMs) on glass or semiconductor substrates by direct writing onto the SAM with an electron beam. - Writing photonic crystals and optical waveguides on III-V semiconductor heterostructures such as GaAs/AlGaAs. - Writing leads onto 2D materials such as graphene and InSe. - Nano-electronic devices in GaAs/AlGaAs heterostructures. - Spintronic devices consisting of thin metal layers deposited by sputtering onto semiconductor devices. - Nanomechanical devices made from silicon nitride on silicon. These applications are scientifically challenging and we require an instrument that writes high fidelity patterns with flexible exposure parameters and excellent resolution and overlay capabilities. ### Tender Lot# 2: Lithography data preparation system Ensuring the maximum throughput of world-leading scientific devices from the lithography tool is very important to us. Therefore it is important that the exposure control of the patterns is calculated correctly. In an ideal world we would hope that the patterns would be exposed correctly first time. This usually means that the resist and substrate need to be modelled in a computer to calculate the proximity correction. This correction might be to the shape of the pattern and/or the exposure of the pattern. As an example consider a ‘bow-tie’ pattern written into a positive electron beam resist on a GaAs substrate consisting of two equilateral triangles of side length 200nm which are separated at one of their vertices by 20nm. To provide an accurate spacing of 20nm and maximum contrast in the resist, the exposure parameters have to be optimised. We are therefore inviting tenders for software tools which will help us maximise the throughput and fidelity of the patterns. We welcome tenders from both electron beam lithography tool suppliers and third parties. EXPRESSIONS OF INTEREST CLOSE: 21 JANUARY 2016 To EXPRESS INTEREST: Please first register on the eTendering system then Login and go to Tenders. Find the project scroll down to View Details and then scroll down to the Express Interest` button at the foot on the right hand side. NOTE: To make sure you receive our email notifications. to ensure our emails reach your inbox please add our email domain @in-tend.co.uk to your safe senders list and check your spam filter settings. Additional information: TENDERERS MUST EXPRESS THEIR INTEREST THROUGH FIRST REGISTERING ON THE UNIVERSITY`S E-TENDERING SYSTEM [in-tendhost.co.uk/universityofnottingham](https://in-tendhost.co.uk/universityofnottingham/) Non-compliant expressions of interest (EOI) will not be considered or acknowledged. The university reserves the right to cancel the tender process at any stage. The University does not accept any liability for any costs incurred in tenderingEXPRESSIONS OF INTEREST CLOSE: 21 JANUARY 2016 To EXPRESS INTEREST: Please first register on the eTendering system then Login and go to Tenders. Find the project scroll down to View Details and then scroll down to the Express Interest` button at the foot on the right hand side. NOTE: To make sure you receive our email notifications. to ensure our emails reach your inbox please add our email domain @in-tend.co.uk to your safe senders list and check your spam filter settings.. Once you have registered, log-in and go to Current Tenders/view printable details, then expressed interest in the project. Once you have registered, expressed interest in the project AND your EOI will be accepted and an email will automatically be sent notifying you (to the inserted publish email address at point of registration) that it has been accepted and a second email notifying you that the documents have been published to your site under `My Tenders`. Internet Explorer (not Mozilla Firefox) should be used and pop ups must be allowed. All correspondence relating to this project should only be made through the e-Tendering web site. Click on CREATE NEW CORRESPONDENCE once you have logged on to the Web site and follow the instructions. Select send message via web option rather than `by email` option as this is received by the host company not directly to UoN. HELP?: Should you encounter any problems with using the Web site (including if you get locked out), contact the In-Tend Help Desk on 0844 272 8810 Is a Recurrent Procurement Type? : No [in-tendhost.co.uk](https://in-tendhost.co.uk/universityofnottingham/aspx/) Read full description ## CPV classification Laboratory, optical and precision equipments (excl. glasses) Source Contracts Finder (UK) [View official notice](https://www.contractsfinder.service.gov.uk/notice/2a1f7cc4-adc9-11e6-9901-0019b9f3037b) Never miss a tender like this again Get AI summaries, deadline alerts and a bid pipeline for tenders matched to your business. Free to start. 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